Plasma Sources For Thin Film Deposition And Etching

Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 0080925138
Total Pages : 328 pages
Book Rating : 4.34/5 ( download)

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Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 9780125330183
Total Pages : 0 pages
Book Rating : 4.89/5 ( download)

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Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 1994-08-18 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Author : Oleg A. Popov
Publisher :
ISBN 13 : 9786612253218
Total Pages : 445 pages
Book Rating : 4.15/5 ( download)

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Download or read book High Density Plasma Sources written by Oleg A. Popov and published by . This book was released on 1995 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.

Author : Oleg A. Popov
Publisher : William Andrew
ISBN 13 : 9780815517894
Total Pages : 465 pages
Book Rating : 4.90/5 ( download)

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Download or read book High Density Plasma Sources written by Oleg A. Popov and published by William Andrew. This book was released on 1996-12-31 with total page 465 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Author : J.J. Pouch
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3035704805
Total Pages : 749 pages
Book Rating : 4.08/5 ( download)

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Download or read book Plasma Properties, Deposition and Etching written by J.J. Pouch and published by Trans Tech Publications Ltd. This book was released on 1993-10-28 with total page 749 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing 42 invited papers, this fine book covers a broad range of subjects on plasmas and applications. In the first section, plasma properties and methods used to characterize the plasma are addressed. Many of these papers also cover deposition or etching of particular materials. The second part focuses on the application of various plasma techniques used to deposit thin films, and on the resulting film properties. Finally, the application of plasma etching to the fabrication of silicon-based circuits, plasma etching of III-V compound semiconductors and other processing applications are discussed in the third and last section.

Author : John L. Vossen
Publisher : Elsevier
ISBN 13 : 0323138985
Total Pages : 577 pages
Book Rating : 4.87/5 ( download)

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Download or read book Thin Film Processes written by John L. Vossen and published by Elsevier. This book was released on 2012-12-02 with total page 577 pages. Available in PDF, EPUB and Kindle. Book excerpt: Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Author : Professor K.S. K.S Sree Harsha
Publisher : Elsevier
ISBN 13 : 9780080480312
Total Pages : 1176 pages
Book Rating : 4.14/5 ( download)

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Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1176 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Author : D. M. Mattox
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.80/5 ( download)

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Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Author : Stephen M. Rossnagel
Publisher : William Andrew
ISBN 13 : 9780815512202
Total Pages : 523 pages
Book Rating : 4.01/5 ( download)

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Download or read book Handbook of Plasma Processing Technology written by Stephen M. Rossnagel and published by William Andrew. This book was released on 1990 with total page 523 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.90/5 ( download)

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Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.