High Density Plasma Sources

Author : Oleg A. Popov
Publisher : Elsevier
ISBN 13 : 0815517890
Total Pages : 467 pages
Book Rating : 4.94/5 ( download)

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Download or read book High Density Plasma Sources written by Oleg A. Popov and published by Elsevier. This book was released on 1996-12-31 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Author : Oleg A. Popov
Publisher : William Andrew
ISBN 13 : 9780815513773
Total Pages : 445 pages
Book Rating : 4.71/5 ( download)

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Download or read book High Density Plasma Sources written by Oleg A. Popov and published by William Andrew. This book was released on 1995 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.

Author : Maurice H. Francombe
Publisher : Elsevier
ISBN 13 : 9780125330183
Total Pages : 352 pages
Book Rating : 4.89/5 ( download)

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Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Elsevier. This book was released on 1994-08-18 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: Steinbrüchel, Christoph; The formation of particles in thin-film processing plasmas.

Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 0080925138
Total Pages : 328 pages
Book Rating : 4.34/5 ( download)

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Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Author : Shunjiro Shinohara
Publisher : Springer Nature
ISBN 13 : 9811929009
Total Pages : 339 pages
Book Rating : 4.07/5 ( download)

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Download or read book High-Density Helicon Plasma Science written by Shunjiro Shinohara and published by Springer Nature. This book was released on 2023-02-03 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights a high-density helicon plasma source produced by radio frequency excitation in the presence of magnetic fields, which has attracted considerable attention thanks to its wide applicability in various fields, from basic science to industrial use. Presenting specific applications such as plasma thrusters, nuclear fusion, and plasma processing, it offers a review of modern helicon plasma science for a broad readership. The book covers a wide range of topics, including the fundamental physics of helicon plasma and their cutting-edge applications, based on his abundant and broad experience from low to high temperature plasmas, using various linear magnetized machines and nuclear fusion ones such as tokamaks and reversed field pinches. It first provides a brief overview of the field and a crash course on the fundamentals of plasma, including miscellaneous diagnostics, for advanced undergraduate and early graduate students in plasma science, and presents the basics of helicon plasma for beginners in the field. Further, digesting advanced application topics is also useful for experts to have a quick overview of extensive helicon plasma science research.

Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309109434
Total Pages : 281 pages
Book Rating : 4.37/5 ( download)

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Download or read book Plasma Science written by National Research Council and published by National Academies Press. This book was released on 2008-01-20 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt: As part of its current physics decadal survey, Physics 2010, the NRC was asked by the DOE, NSF, and NASA to carry out an assessment of and outlook for the broad field of plasma science and engineering over the next several years. The study was to focus on progress in plasma research, identify the most compelling new scientific opportunities, evaluate prospects for broader application of plasmas, and offer guidance to realize these opportunities. The study paid particular attention to these last two points. This "demand-side" perspective provided a clear look at what plasma research can do to help achieve national goals of fusion energy, economic competitiveness, and nuclear weapons stockpile stewardship. The report provides an examination of the broad themes that frame plasma research: low-temperature plasma science and engineering; plasma physics at high energy density; plasma science of magnetic fusion; space and astrophysical science; and basic plasma science. Within those themes, the report offers a bold vision for future developments in plasma science.

Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 9780125330183
Total Pages : 0 pages
Book Rating : 4.89/5 ( download)

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Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 1994-08-18 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309045975
Total Pages : 88 pages
Book Rating : 4.71/5 ( download)

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Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.90/5 ( download)

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Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author : H. Schlüter
Publisher : Springer Science & Business Media
ISBN 13 : 9401706336
Total Pages : 580 pages
Book Rating : 4.39/5 ( download)

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Download or read book Advanced Technologies Based on Wave and Beam Generated Plasmas written by H. Schlüter and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 580 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas