Fundamental Electron Interactions With Plasma Processing Gases

Author : Loucas G. Christophorou
Publisher : Springer Science & Business Media
ISBN 13 : 1441989714
Total Pages : 791 pages
Book Rating : 4.10/5 ( download)

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Download or read book Fundamental Electron Interactions with Plasma Processing Gases written by Loucas G. Christophorou and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 791 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309045975
Total Pages : 88 pages
Book Rating : 4.71/5 ( download)

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Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author : Gorur Govinda Raju
Publisher : CRC Press
ISBN 13 : 1351833324
Total Pages : 826 pages
Book Rating : 4.25/5 ( download)

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Download or read book Gaseous Electronics written by Gorur Govinda Raju and published by CRC Press. This book was released on 2018-09-03 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics. The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact. An unprecedented collection and analysis of electron neutral collision properties This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity. Some recent research areas in gaseous electronics include: Environmentally efficient and protective lighting devices Plasma research for power generation and space applications Medical applications (some involving skin treatment and healing) Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.

Author : K. N. Joshipura
Publisher : Cambridge University Press
ISBN 13 : 1108498906
Total Pages : 286 pages
Book Rating : 4.06/5 ( download)

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Download or read book Atomic-Molecular Ionization by Electron Scattering written by K. N. Joshipura and published by Cambridge University Press. This book was released on 2019-01-24 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers quantum scattering theories, experimental and theoretical calculations and applications in a comprehensive manner.

Author : Jörg Florian Friedrich
Publisher : John Wiley & Sons
ISBN 13 : 1119364760
Total Pages : 805 pages
Book Rating : 4.64/5 ( download)

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Download or read book Nonthermal Plasmas for Materials Processing written by Jörg Florian Friedrich and published by John Wiley & Sons. This book was released on 2022-07-15 with total page 805 pages. Available in PDF, EPUB and Kindle. Book excerpt: NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.

Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 634 pages
Book Rating : 4.89/5 ( download)

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Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Author : Jurgen Meichsner
Publisher : CRC Press
ISBN 13 : 1420059165
Total Pages : 566 pages
Book Rating : 4.68/5 ( download)

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Download or read book Nonthermal Plasma Chemistry and Physics written by Jurgen Meichsner and published by CRC Press. This book was released on 2012-11-13 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.90/5 ( download)

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Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author : Loucas C. Christophorou
Publisher : Springer Science & Business Media
ISBN 13 : 144198979X
Total Pages : 507 pages
Book Rating : 4.96/5 ( download)

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Download or read book Gaseous Dielectrics X written by Loucas C. Christophorou and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book contains a broad and in depth review by leading world experts of the progress and the problems of current interest in gaseous dielectrics and their use, especially as insulators in high-voltage equipment and substations. Recent advances in superconductivity for power transmission and in plasma technology are also included. The fundamental, applied and industrial research described in the book allows the electric power industry to transmit and distribute electrical energy in more efficient, safe and environmentally acceptable ways.

Author : Essam Nasser
Publisher : John Wiley & Sons
ISBN 13 :
Total Pages : 488 pages
Book Rating : 4.44/5 ( download)

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Download or read book Fundamentals of Gaseous Ionization and Plasma Electronics written by Essam Nasser and published by John Wiley & Sons. This book was released on 1971 with total page 488 pages. Available in PDF, EPUB and Kindle. Book excerpt: