Compact Plasma And Focused Ion Beams

Author : Sudeep Bhattacharjee
Publisher : Taylor & Francis
ISBN 13 : 1466557885
Total Pages : 394 pages
Book Rating : 4.88/5 ( download)

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Download or read book Compact Plasma and Focused Ion Beams written by Sudeep Bhattacharjee and published by Taylor & Francis. This book was released on 2013-12-12 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.

Author : Sudeep Bhattacharjee
Publisher : Taylor & Francis
ISBN 13 : 1466557923
Total Pages : 390 pages
Book Rating : 4.25/5 ( download)

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Download or read book Compact Plasma and Focused Ion Beams written by Sudeep Bhattacharjee and published by Taylor & Francis. This book was released on 2013-12-12 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ran

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ISBN 13 :
Total Pages : pages
Book Rating : 4.98/5 ( download)

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Download or read book Focused Electron and Ion Beam Systems written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.

Author :
Publisher :
ISBN 13 :
Total Pages : 10 pages
Book Rating : 4.80/5 ( download)

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Download or read book Mini RF-driven Ion Source for Focused Ion Beam System written by and published by . This book was released on 2002 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt: Mini RF-driven ion sources with 1.2 cm and 1.5 cm inner chamber diameter have been developed at Lawrence Berkeley National Laboratory. Several gas species have been tested including argon, krypton and hydrogen. These mini ion sources operate in inductively coupled mode and are capable of generating high current density ion beams at tens of watts. Since the plasma potential is relatively low in the plasma chamber, these mini ion sources can function reliably without any perceptible sputtering damage. The mini RF-driven ion sources will be combined with electrostatic focusing columns, and are capable of producing nano focused ion beams for micro machining and semiconductor fabrications.

Author : Jon Orloff
Publisher : Springer Science & Business Media
ISBN 13 : 1461507650
Total Pages : 304 pages
Book Rating : 4.59/5 ( download)

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Download or read book High Resolution Focused Ion Beams: FIB and its Applications written by Jon Orloff and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.

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ISBN 13 :
Total Pages : pages
Book Rating : 4.64/5 ( download)

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Download or read book Plasma Ion Sources and Ion Beam Technology Inmicrofabrications written by and published by . This book was released on 2007 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: For over decades, focused ion beam (FIB) has been playing a very important role in microscale technology and research, among which, semiconductor microfabrication is one of its biggest application area. As the dimensions of IC devices are scaled down, it has shown the need for new ion beam tools and new approaches to the fabrication of small-scale devices. In the meanwhile, nanotechnology has also deeply involved in material science research and bioresearch in recent years. The conventional FIB systems which utilize liquid gallium ion sources to achieve nanometer scale resolution can no longer meet the various requirements raised from such a wide application area such as low contamination, high throughput and so on. The drive towards controlling materials properties at nanometer length scales relies on the availability of efficient tools. In this thesis, three novel ion beam tools have been developed and investigated as the alternatives for the conventional FIB systems in some particular applications. An integrated focused ion beam (FIB) and scanning electron microscope (SEM) system has been developed for direct doping or surface modification. This new instrument employs a mini-RF driven plasma source to generate focused ion beam with various ion species, a FEI two-lens electron (2LE) column for SEM imaging, and a five-axis manipulator system for sample positioning. An all-electrostatic two-lens column has been designed to focus the ion beam extracted from the source. Based on the Munro ion optics simulation, beam spot sizes as small as 100 nm can be achieved at beam energies between 5 to 35 keV if a 5 [mu]m-diameter extraction aperture is used. Smaller beam spot sizes can be obtained with smaller apertures at sacrifice of some beam current. The FEI 2LE column, which utilizes Schottky emission, electrostatic focusing optics, and stacked-disk column construction, can provide high-resolution (as small as 20 nm) imaging capability, with fairly long working distance (25 mm) at 25 keV beam voltage. Such an integrated FIB/SEM dual-beam system will not only improve the accuracy and reproducibility when performing ion beam sculpting and direct implantation processes, but will also enable researchers to perform cross-sectioning, imaging, and analysis with the same tool. A major advantage of this approach is the ability to produce a wide variety of ion species tailored to the application.

Author : Nan Yao
Publisher : Cambridge University Press
ISBN 13 : 1107320569
Total Pages : 496 pages
Book Rating : 4.67/5 ( download)

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Download or read book Focused Ion Beam Systems written by Nan Yao and published by Cambridge University Press. This book was released on 2007-09-13 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

Author : Bernd Schmidt
Publisher : Springer Science & Business Media
ISBN 13 : 3211993568
Total Pages : 425 pages
Book Rating : 4.69/5 ( download)

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Download or read book Ion Beams in Materials Processing and Analysis written by Bernd Schmidt and published by Springer Science & Business Media. This book was released on 2012-12-13 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Author :
Publisher :
ISBN 13 :
Total Pages : 1470 pages
Book Rating : 4.24/5 ( download)

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Download or read book Energy Research Abstracts written by and published by . This book was released on 1989 with total page 1470 pages. Available in PDF, EPUB and Kindle. Book excerpt:

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ISBN 13 :
Total Pages : pages
Book Rating : 4.43/5 ( download)

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Download or read book Develpoment of a One-meter Plasma Source for Heavy Ion Beam Chargeneutralization written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Highly ionized plasmas are being employed as a medium for charge neutralizing heavy ion beams in order to focus to a small spot size. Calculations suggest that plasma at a density of 1-100 times the ion beam density and at a length (almost equal to) 0.1-1 m would be suitable for achieving a high level of charge neutralization. A radio frequency (RF) source was constructed at the Princeton Plasma Physics Laboratory (PPPL) in support of the joint Neutralized Transport Experiment (NTX) at the Lawrence Berkeley National Laboratory (LBNL) to study ion beam neutralization. Pulsing the source enabled operation at pressures (almost equal to) 10−6 Torr with plasma densities of 1011 cm−3. Near 100% ionization was achieved. The plasma was 10 cm in length, but future experiments require a source 1 m long. The RF source does not easily scale to the length. Consequently, large-volume plasma sources based upon ferroelectric ceramics are being considered. These sources have the advantage of being able to increase the length of the plasma and operate at low neutral pressures. The source will utilize the ferroelectric ceramic BaTiO3 to form metal plasma. A 1 m long section of the drift tube inner surface of NTX will be covered with ceramic. A high voltage ((almost equal to) 1-5 kV) is applied between the drift tube and the front surface of the ceramic by placing a wire grid on the front surface. Plasma densities of 1012 cm−3 and neutral pressures (almost equal to) 10−6 Torr are expected. A test stand to produce 20 cm long plasma is being constructed and will be tested before a 1 m long source is developed.