Chemical Vapor Deposition Of Epitaxial Silicon Germanium Carbon Alloys Using Cyclopropane As A Carbon Source Gas

Author : James R. Dekker
Publisher :
ISBN 13 :
Total Pages : 406 pages
Book Rating : 4.12/5 ( download)

DOWNLOAD NOW!

Download or read book Chemical Vapor Deposition of Epitaxial Silicon-germanium-carbon Alloys Using Cyclopropane as a Carbon Source Gas written by James R. Dekker and published by . This book was released on 1998 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author : Theodore M. Besmann
Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.52/5 ( download)

DOWNLOAD NOW!

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author : Pankaj Neelkanth Joshi
Publisher :
ISBN 13 :
Total Pages : 294 pages
Book Rating : 4.98/5 ( download)

DOWNLOAD NOW!

Download or read book Chemical Vapor Deposition of Silicon-germanium-carbon Films written by Pankaj Neelkanth Joshi and published by . This book was released on 1998 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.62/5 ( download)

DOWNLOAD NOW!

Download or read book Chemical Vapor Deposition of Epitaxial Silicon written by and published by . This book was released on 1984 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

Author : Mark Donald Allendorf
Publisher : The Electrochemical Society
ISBN 13 : 9781566772174
Total Pages : 506 pages
Book Rating : 4.76/5 ( download)

DOWNLOAD NOW!

Download or read book Proceedings of the Symposium on Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis written by Mark Donald Allendorf and published by The Electrochemical Society. This book was released on 1999 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.81/5 ( download)

DOWNLOAD NOW!

Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author : Arthur Sherman
Publisher : William Andrew
ISBN 13 :
Total Pages : 240 pages
Book Rating : 4.27/5 ( download)

DOWNLOAD NOW!

Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566773195
Total Pages : 526 pages
Book Rating : 4.99/5 ( download)

DOWNLOAD NOW!

Download or read book Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 2001 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.68/5 ( download)

DOWNLOAD NOW!

Download or read book Silicon and Germanium Thin Film Chemical Vapor Deposition, Modeling and Control written by and published by . This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: From 1995-2000, researchers at The University of Texas at Austin and the University of Wisconsin, Madison investigated and demonstrated new, intelligent manufacturing processes for growing epitaxial silicon alloy thin films that employ input from in situ optical process sensors to maintain precise control of film composition and thickness. The research team accomplished what was set forth in the original proposal. Significant progress was made in understanding the fundamental chemistry and physics of thin alloy films that affects the sensor operation and growth models, in developing and implementing state estimation and model predictive control techniques, in advancing optical sensors that can provide a complete description of the film properties, and in the design and demonstration of strained SiGe/Si and SiGeC/Si heterostructures with significant device performance enhancements over Si-based devices.

Author : John D. Leighton
Publisher :
ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.2D/5 ( download)

DOWNLOAD NOW!

Download or read book Rapid Thermal Vapor Phase Epitaxy written by John D. Leighton and published by . This book was released on 1994 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: